Publication:

Image-force barrier lowering of Schottky barriers in two-dimensional materials as a function of metal contact angle

Date

2023
Journal article
https://doi.org/10.1103/PhysRevApplied.20.044003
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dc.contributor.authorEvans, Sarah R.
dc.contributor.authorDeylgat, Emeric
dc.contributor.authorChen, Edward
dc.contributor.authorVandenberghe, William G.
dc.contributor.imecauthorDeylgat, Emeric
dc.date.accessioned2024-02-29T16:05:15Z
dc.date.available2023-11-10T17:29:48Z
dc.date.available2024-02-29T16:05:15Z
dc.date.issued2023
dc.description.wosFundingTextThis material is based upon work supported by the Taiwan Semiconductor Manufacturing Company, Ltd.
dc.identifier.doi10.1103/PhysRevApplied.20.044003
dc.identifier.issn2331-7019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/43125
dc.publisherAMER PHYSICAL SOC
dc.source.beginpageArt. 044003
dc.source.endpageN/A
dc.source.issue4
dc.source.journalPHYSICAL REVIEW APPLIED
dc.source.numberofpages10
dc.source.volume23
dc.subject.keywordsMONOLAYER
dc.subject.keywordsRESISTANCE
dc.subject.keywordsGRAPHENE
dc.title

Image-force barrier lowering of Schottky barriers in two-dimensional materials as a function of metal contact angle

dc.typeJournal article
dspace.entity.typePublication
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