Skip to content
Institutional repository
Communities & Collections
Browse
Site
Log In
imec Publications
Conference contributions
Process and device design influence on the ESD performance of a fully silicided 0.25mm CMOS technology
Publication:
Process and device design influence on the ESD performance of a fully silicided 0.25mm CMOS technology
Date
1997
Proceedings Paper
Simple item page
Full metadata
Statistics
Loading...
Loading...
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Bock, Karlheinz
;
Russ, Christian
;
Badenes, Gonçal
;
Groeseneken, Guido
;
Deferm, Ludo
Journal
Abstract
Description
Metrics
Views
1938
since deposited on 2021-09-30
Acq. date: 2025-10-23
Citations
Metrics
Views
1938
since deposited on 2021-09-30
Acq. date: 2025-10-23
Citations