Publication:

CVD-Mn/CVD-Ru-based barrier/liner solution for advanced BEOL Cu/low-k interconnects

Date

2016
Proceedings Paper
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dc.contributor.authorJourdan, Nicolas
dc.contributor.authorvan der Veen, Marleen
dc.contributor.authorVega Gonzalez, Victor
dc.contributor.authorCroes, Kristof
dc.contributor.authorLesniewska, Alicja
dc.contributor.authorVarela Pedreira, Olalla
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorBoemmels, Juergen
dc.contributor.authorTokei, Zsolt
dc.contributor.imecauthorJourdan, Nicolas
dc.contributor.imecauthorvan der Veen, Marleen
dc.contributor.imecauthorVega Gonzalez, Victor
dc.contributor.imecauthorCroes, Kristof
dc.contributor.imecauthorLesniewska, Alicja
dc.contributor.imecauthorVarela Pedreira, Olalla
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorBoemmels, Juergen
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.orcidimecvan der Veen, Marleen::0000-0002-9402-8922
dc.contributor.orcidimecCroes, Kristof::0000-0002-3955-0638
dc.contributor.orcidimecLesniewska, Alicja::0000-0003-3863-065X
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.accessioned2021-10-23T11:35:56Z
dc.date.available2021-10-23T11:35:56Z
dc.date.embargo9999-12-31
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26793
dc.identifier.urlhttp://ieeexplore.ieee.org/document/7507652/
dc.source.beginpage37
dc.source.conferenceIEEE International Interconnect Technology Conference / Advanced Metallization Conference - IITC/AMC
dc.source.conferencedate23/05/2016
dc.source.conferencelocationSan Jose, CA USa
dc.source.endpage39
dc.title

CVD-Mn/CVD-Ru-based barrier/liner solution for advanced BEOL Cu/low-k interconnects

dc.typeProceedings paper
dspace.entity.typePublication
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