Publication:

The assessment of border traps in high-mobility channel materials

Date

 
dc.contributor.authorSimoen, Eddy
dc.contributor.authorAlian, AliReza
dc.contributor.authorArimura, Hiroaki
dc.contributor.authorLin, Dennis
dc.contributor.authorMertens, Hans
dc.contributor.authorMitard, Jerome
dc.contributor.authorSioncke, Sonja
dc.contributor.authorFang, Wen
dc.contributor.authorLuo, Jun
dc.contributor.authorZhao, Chao
dc.contributor.authorMocuta, Anda
dc.contributor.authorCollaert, Nadine
dc.contributor.authorThean, Aaron
dc.contributor.authorClaeys, Cor
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorAlian, AliReza
dc.contributor.imecauthorArimura, Hiroaki
dc.contributor.imecauthorLin, Dennis
dc.contributor.imecauthorMertens, Hans
dc.contributor.imecauthorMitard, Jerome
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorThean, Aaron
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.contributor.orcidimecMitard, Jerome::0000-0002-7422-079X
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.date.accessioned2021-10-22T22:52:53Z
dc.date.available2021-10-22T22:52:53Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25907
dc.identifier.urlhttp://ecst.ecsdl.org/content/69/5/205.short?cited-by=yes&legid=ecst;69/5/205
dc.source.beginpage205
dc.source.conferenceSemiconductors, Dielectrics, and Metals for Nanoelectronics 13
dc.source.conferencedate11/10/2015
dc.source.conferencelocationPhoenix, AZ USA
dc.source.endpage217
dc.title

The assessment of border traps in high-mobility channel materials

dc.typeProceedings paper
dspace.entity.typePublication
Files
Publication available in collections: