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ToF-SIMS and XPS characterization of plasma etch residues on cobalt silicide surfaces

Date

1997
Proceedings Paper
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dc.contributor.authorStorm, Wolfgang
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorVanhaelemeersch, Serge
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorMaex, Karen
dc.contributor.authorPoleunis, C.
dc.contributor.authorBertrand, P.
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.date.accessioned2021-09-30T09:35:40Z
dc.date.available2021-09-30T09:35:40Z
dc.date.embargo9999-12-31
dc.date.issued1997
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2159
dc.source.beginpage921
dc.source.conferenceSecondary Ion Mass Spectrometry - SIMS X : Proceedings of the 10th International Conference
dc.source.conferencedate2/10/1995
dc.source.conferencelocationMünster Germany
dc.source.endpage924
dc.title

ToF-SIMS and XPS characterization of plasma etch residues on cobalt silicide surfaces

dc.typeProceedings paper
dspace.entity.typePublication
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