Publication:

Cleaning aspects of novel materials after CMP

Date

2011
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorVos, Rita
dc.contributor.authorWada, M.
dc.contributor.authorArnauts, Sophia
dc.contributor.authorTakahashi, H.
dc.contributor.authorCuypers, Daniel
dc.contributor.authorStruyf, Herbert
dc.contributor.authorMertens, Paul
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorArnauts, Sophia
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorMertens, Paul
dc.date.accessioned2021-10-19T21:33:33Z
dc.date.available2021-10-19T21:33:33Z
dc.date.embargo9999-12-31
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20119
dc.source.beginpage671
dc.source.conferenceCMP and Post-CMP Cleaning
dc.source.conferencedate14/03/2011
dc.source.conferencelocationShanghai China
dc.source.endpage676
dc.title

Cleaning aspects of novel materials after CMP

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
24387.pdf
Size:
382.05 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions