Publication:

Impact of EOT scaling down to 0.85nm on 70nm Ge-pFETs technology with STI

Date

2009
Proceedings Paper
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dc.contributor.authorMitard, Jerome
dc.contributor.authorShea, C.
dc.contributor.authorDe Jaeger, Brice
dc.contributor.authorPristera, Andrea
dc.contributor.authorWang, Gang
dc.contributor.authorHoussa, Michel
dc.contributor.authorEneman, Geert
dc.contributor.authorHellings, Geert
dc.contributor.authorWang, Wei-E
dc.contributor.authorLin, J.C.
dc.contributor.authorLeys, Frederik
dc.contributor.authorLoo, Roger
dc.contributor.authorWinderickx, Gillis
dc.contributor.authorVrancken, Evi
dc.contributor.authorStesmans, Andre
dc.contributor.authorDe Meyer, Kristin
dc.contributor.authorCaymax, Matty
dc.contributor.authorPantisano, Luigi
dc.contributor.authorMeuris, Marc
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorMitard, Jerome
dc.contributor.imecauthorDe Jaeger, Brice
dc.contributor.imecauthorHoussa, Michel
dc.contributor.imecauthorEneman, Geert
dc.contributor.imecauthorHellings, Geert
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorWinderickx, Gillis
dc.contributor.imecauthorVrancken, Evi
dc.contributor.imecauthorStesmans, Andre
dc.contributor.imecauthorDe Meyer, Kristin
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecMitard, Jerome::0000-0002-7422-079X
dc.contributor.orcidimecDe Jaeger, Brice::0000-0001-8804-7556
dc.contributor.orcidimecHoussa, Michel::0000-0003-1844-3515
dc.contributor.orcidimecEneman, Geert::0000-0002-5849-3384
dc.contributor.orcidimecHellings, Geert::0000-0002-5376-2119
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.accessioned2021-10-18T00:53:33Z
dc.date.available2021-10-18T00:53:33Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15877
dc.source.beginpage82
dc.source.conferenceSymposium on VLSI Technology
dc.source.conferencedate15/06/2009
dc.source.conferencelocationKyoto Japan
dc.source.endpage83
dc.title

Impact of EOT scaling down to 0.85nm on 70nm Ge-pFETs technology with STI

dc.typeProceedings paper
dspace.entity.typePublication
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