Publication:

Image contrast contributions to immersion lithography defect formation and process yield

Date

2008
Proceedings Paper
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dc.contributor.authorRathsack, Ben
dc.contributor.authorHooge, Joshua
dc.contributor.authorScheer, Steven
dc.contributor.authorNafus, Kathleen
dc.contributor.authorHatakeyama, Shinichi
dc.contributor.authorKouichi, Hontake
dc.contributor.authorKitano, Junichi
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorLeray, Philippe
dc.contributor.authorHendrickx, Eric
dc.contributor.authorFoubert, Philippe
dc.contributor.authorGronheid, Roel
dc.contributor.imecauthorScheer, Steven
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorGronheid, Roel
dc.date.accessioned2021-10-17T10:06:39Z
dc.date.available2021-10-17T10:06:39Z
dc.date.embargo9999-12-31
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14362
dc.source.beginpage69244W
dc.source.conferenceOptical Microlithography XXI
dc.source.conferencedate24/02/2008
dc.source.conferencelocationSan Jose, CA USA
dc.title

Image contrast contributions to immersion lithography defect formation and process yield

dc.typeProceedings paper
dspace.entity.typePublication
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