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Maskless fabrication of high density silicon nan-pin structures with carbon nano clusters acting as mask for subsequent microwave silicon etching

Date

 
dc.contributor.authorYanovich, S.
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorGushchin, O.
dc.contributor.authorGornev, E.
dc.contributor.authorDanila, A.
dc.date.accessioned2021-10-20T19:12:38Z
dc.date.available2021-10-20T19:12:38Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21876
dc.source.conferencePlasma Etch and Strip in Microelectronics - PESM
dc.source.conferencedate15/03/2012
dc.source.conferencelocationGrenoble France
dc.title

Maskless fabrication of high density silicon nan-pin structures with carbon nano clusters acting as mask for subsequent microwave silicon etching

dc.typeMeeting abstract
dspace.entity.typePublication
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