Publication:

Holistic patterning technology for DRAM 29nm pitch contact hole and pillar patterning

Date

2024

Proceedings Paper

https://doi.org/10.1117/12.3034701

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Author(s)

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Pham, Van Tuong

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Verstraete, Lander

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Bae, Hyung Jong

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Journal

N/A

Statistics

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