Publication:

Holistic patterning technology for DRAM 29nm pitch contact hole and pillar patterning

Date

2024
Proceedings Paper
https://doi.org/10.1117/12.3034701
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Author(s)

Park, Seunghak
;
Pham, Van Tuong  
;
Yun, Sangho
;
Jung, Woojin
;
Suh, Hyo Seon  
;
Verstraete, Lander  
;
Bae, Hyung Jong
;
Park, Taehoi
;
Blanco, Victor  
;
Heo, Seonggil  
;
Ronse, Kurt  
;
Hwang, Chan

Journal

N/A

Abstract

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148 since deposited on 2025-05-11
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Acq. date: 2026-04-25

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