Publication:

CMOS 32nm technology node: business as usual for interconnect damascene patterning?

Date

2008-12
Journal article
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Author(s)

Beyer, Gerald  
;
Ciofi, Ivan  
;
Van Olmen, Jan  
;
Carbonell, Laure
;
Versluijs, Janko  
;
Wiaux, Vincent  
;
Op de Beeck, Maaike  
;
Maenhoudt, Mireille
;
Struyf, Herbert  
;
Hendrickx, Dirk  
;
de Marneffe, Jean-Francois  
;
Vereecke, Guy  
;
Claes, Martine  
;
Bearda, Twan
;
Volders, Henny  
;
Heylen, Nancy  
;
Travaly, Youssef
;
Stucchi, Michele  
;
Tokei, Zsolt  
;
Cartuyvels, Rudi  

Journal

Semiconductor Fabtech

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