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Wafer-scale growth of graphene on Ge and Si wafers by reduced-pressure chemical vapor deposition

Date

2016-11
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dc.contributor.authorPorret, Clément
dc.contributor.authorLuraschi, Claudio
dc.contributor.authorNuytten, Thomas
dc.contributor.authorVanhaeren, Danielle
dc.contributor.authorConard, Thierry
dc.contributor.authorVerguts, Ken
dc.contributor.authorBrems, Steven
dc.contributor.authorCaymax, Matty
dc.contributor.authorLanger, Robert
dc.contributor.authorLoo, Roger
dc.contributor.imecauthorPorret, Clément
dc.contributor.imecauthorNuytten, Thomas
dc.contributor.imecauthorVanhaeren, Danielle
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorBrems, Steven
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorLanger, Robert
dc.contributor.imecauthorLoo, Roger
dc.contributor.orcidimecPorret, Clément::0000-0002-4561-348X
dc.contributor.orcidimecNuytten, Thomas::0000-0002-5921-6928
dc.contributor.orcidimecVanhaeren, Danielle::0000-0001-8624-9533
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecBrems, Steven::0000-0002-0282-8528
dc.contributor.orcidimecLanger, Robert::0000-0002-1132-3468
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.date.accessioned2021-10-23T13:51:32Z
dc.date.available2021-10-23T13:51:32Z
dc.date.issued2016-11
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27165
dc.source.beginpage32
dc.source.conferenceJSPS - FZ-Jülich Workshop on "Atomically Controlled Processing for Ultra-large Scale Integration"
dc.source.conferencedate24/11/2016
dc.source.conferencelocationJülich Germany
dc.source.endpage33
dc.title

Wafer-scale growth of graphene on Ge and Si wafers by reduced-pressure chemical vapor deposition

dc.typeMeeting abstract
dspace.entity.typePublication
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