Skip to content
Institutional repository
Communities & Collections
Browse
Site
Log In
imec Publications
Conference contributions
300 mm-wafer characterization of ruthenium area-selective deposition in nanoscale line-space and hole patterns
Publication:
300 mm-wafer characterization of ruthenium area-selective deposition in nanoscale line-space and hole patterns
Date
2020
Meeting abstract
Simple item page
Full metadata
Statistics
Loading...
Loading...
Files
43161.pdf
68.02 KB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Clerix, Jan-Willem
;
Delabie, Annelies
;
Hung, Joey
;
Warad, L.
;
Shah, Kavita
Journal
Abstract
Description
Metrics
Views
2136
since deposited on 2021-10-28
Acq. date: 2025-10-23
Citations
Metrics
Views
2136
since deposited on 2021-10-28
Acq. date: 2025-10-23
Citations