Publication:

An automated method for overlay sample plan optimization based on spatial variation modeling

Date

2001
Proceedings Paper
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dc.contributor.authorChen, X.
dc.contributor.authorPreil, M. E.
dc.contributor.authorDussable, Mathilde
dc.contributor.authorMaenhoudt, Mireille
dc.date.accessioned2021-10-14T16:41:30Z
dc.date.available2021-10-14T16:41:30Z
dc.date.embargo9999-12-31
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5138
dc.source.beginpage257
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XV
dc.source.conferencedate26/02/2001
dc.source.conferencelocationSanta Clara, CA USA
dc.source.endpage267
dc.title

An automated method for overlay sample plan optimization based on spatial variation modeling

dc.typeProceedings paper
dspace.entity.typePublication
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