Publication:
Orientation-dependent stress build-up during the formation of epitaxial CoSi2
Date
| dc.contributor.author | Steegen, An | |
| dc.contributor.author | Detavernier, C. | |
| dc.contributor.author | Lauwers, A. | |
| dc.contributor.author | Maex, Karen | |
| dc.contributor.author | Van Meirhaeghe, R. L. | |
| dc.contributor.author | Cardon, F. | |
| dc.contributor.imecauthor | Maex, Karen | |
| dc.date.accessioned | 2021-10-14T17:52:44Z | |
| dc.date.available | 2021-10-14T17:52:44Z | |
| dc.date.issued | 2001 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/5672 | |
| dc.source.beginpage | 145 | |
| dc.source.endpage | 150 | |
| dc.source.issue | 1_4 | |
| dc.source.journal | Microelectronic Engineering | |
| dc.source.volume | 55 | |
| dc.title | Orientation-dependent stress build-up during the formation of epitaxial CoSi2 | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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