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Influences of metal, non-metal precursors, and substrates on atomic layer deposition processes

Date

2013
Journal article
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dc.contributor.authorHan, Jeong Hwan
dc.contributor.authorLee, Sang Woon
dc.contributor.authorChoi, Byung Joon
dc.contributor.authorEom, Taeyong
dc.contributor.authorKim, Seong Keun
dc.contributor.authorSong, Seul Ji
dc.contributor.authorLee, Woongkyu
dc.contributor.authorHwang, cheol seong
dc.date.accessioned2021-10-21T08:07:42Z
dc.date.available2021-10-21T08:07:42Z
dc.date.issued2013
dc.identifier.issn0010-8545
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22457
dc.identifier.urlhttp://www.sciencedirect.com/science/article/pii/S0010854513000933
dc.source.beginpage3154
dc.source.endpage3176
dc.source.issue23_24
dc.source.journalCoordination Chemistry Reviews
dc.source.volume257
dc.title

Influences of metal, non-metal precursors, and substrates on atomic layer deposition processes

dc.typeJournal article
dspace.entity.typePublication
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