Publication:

Impact of CVD chemistry on band alignment at the MoS2/SiO2 interface

Date

2023
Journal article
https://doi.org/10.1016/j.sse.2023.108782
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dc.contributor.authorTummala, P. P.
dc.contributor.authorDelie, Gilles
dc.contributor.authorCataldo, A.
dc.contributor.authorGhomi, S.
dc.contributor.authorMartella, C.
dc.contributor.authorFerrini, G.
dc.contributor.authorMolle, A.
dc.contributor.authorLamperti, A.
dc.contributor.authorAfanasiev, Valeri
dc.contributor.imecauthorDelie, Gilles
dc.contributor.imecauthorAfanasiev, Valeri
dc.contributor.orcidimecDelie, Gilles::0000-0002-5646-3261
dc.contributor.orcidimecAfanasiev, Valeri::0000-0001-5018-4539
dc.date.accessioned2024-04-25T07:34:50Z
dc.date.available2023-10-27T16:54:42Z
dc.date.available2024-04-25T07:34:50Z
dc.date.embargo2024-03-28
dc.date.issued2023
dc.identifier.doi10.1016/j.sse.2023.108782
dc.identifier.issn0038-1101
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/42984
dc.publisherPERGAMON-ELSEVIER SCIENCE LTD
dc.source.beginpageArt. 108782
dc.source.endpageN/A
dc.source.issueN/A
dc.source.journalSOLID-STATE ELECTRONICS
dc.source.numberofpages4
dc.source.volume209
dc.title

Impact of CVD chemistry on band alignment at the MoS2/SiO2 interface

dc.typeJournal article
dspace.entity.typePublication
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