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Influence of the sidewall crystal orientation, HfSiO nitridation and TiN metal gate thickness on n-MuGFETs under analog operation
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1853 since deposited on 2021-10-19
Acq. date: 2025-12-09
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Views
1853 since deposited on 2021-10-19
Acq. date: 2025-12-09
Citations