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Electrodeposition for die-to-wafer very high-density interconnect

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dc.contributor.authorInoue, Fumihiro
dc.contributor.imecauthorInoue, Fumihiro
dc.date.accessioned2021-10-28T22:45:56Z
dc.date.available2021-10-28T22:45:56Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/35305
dc.identifier.urlhttps://iopscience.iop.org/article/10.1149/MA2020-02251786mtgabs
dc.source.beginpage1786
dc.source.conferencePRiME2020. Symposium G05: Materials and Processes for Semiconductor, 2.5 and 3D, Chip Packaging, PCB, FPCB and Wafer Bonding 3
dc.source.conferencedate4/10/2020
dc.source.conferencelocationVirtual Virtual
dc.title

Electrodeposition for die-to-wafer very high-density interconnect

dc.typeMeeting abstract
dspace.entity.typePublication
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