Publication:

Wafer scale processing of plasmonic nanopore arrays in 200mm CMOS fab environment

Date

2012
Meeting abstract
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dc.contributor.authorMalachowski, Karl
dc.contributor.authorVerbeeck, Rita
dc.contributor.authorDupont, Tania
dc.contributor.authorChen, Chang
dc.contributor.authorMusa, Silke
dc.contributor.authorLi, Yi
dc.contributor.authorStakenborg, Tim
dc.contributor.authorSabuncuoglu Tezcan, Deniz
dc.contributor.authorVan Dorpe, Pol
dc.contributor.imecauthorVerbeeck, Rita
dc.contributor.imecauthorDupont, Tania
dc.contributor.imecauthorStakenborg, Tim
dc.contributor.imecauthorSabuncuoglu Tezcan, Deniz
dc.contributor.imecauthorVan Dorpe, Pol
dc.contributor.orcidimecStakenborg, Tim::0000-0001-9878-9078
dc.contributor.orcidimecSabuncuoglu Tezcan, Deniz::0000-0002-9237-7862
dc.contributor.orcidimecVan Dorpe, Pol::0000-0003-0918-1664
dc.date.accessioned2021-10-20T13:07:46Z
dc.date.available2021-10-20T13:07:46Z
dc.date.embargo9999-12-31
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21084
dc.source.beginpage3987
dc.source.conferenceECS Fall Meeting Symposium J6: Microfabricated and Nanofabricated Systems for MEMS/NEMS
dc.source.conferencedate7/10/2012
dc.source.conferencelocationHonolulu, HI USA
dc.title

Wafer scale processing of plasmonic nanopore arrays in 200mm CMOS fab environment

dc.typeMeeting abstract
dspace.entity.typePublication
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