Dry development in an O2/SO2 plasma for sub-0.18 μm top layer imaging processes

dc.contributor.author	Goethals, Mieke
dc.contributor.author	Van Roey, Frieda
dc.contributor.author	Sugihara, Takashi
dc.contributor.author	Van den hove, Luc
dc.contributor.author	Vertommen, Johan
dc.contributor.author	Klippert, W.
dc.contributor.imecauthor	Van Roey, Frieda
dc.contributor.imecauthor	Van den hove, Luc
dc.date.accessioned	2021-09-30T12:01:09Z
dc.date.available	2021-09-30T12:01:09Z
dc.date.embargo	9999-12-31
dc.date.issued	1998
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/2589
dc.source.beginpage	3322
dc.source.endpage	3333
dc.source.issue	6
dc.source.journal	Journal of Vacuum Science and Technology B
dc.source.volume	12
dc.title	Dry development in an O2/SO2 plasma for sub-0.18 μm top layer imaging processes
dc.type	Journal article
dspace.entity.type	Publication
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