Publication:  
Advanced lithography materials as key scaling enablers
Date
| dc.contributor.author | Vandenberghe, Geert | |
| dc.contributor.author | De Simone, Danilo | |
| dc.contributor.author | Gronheid, Roel | |
| dc.contributor.imecauthor | Vandenberghe, Geert | |
| dc.contributor.imecauthor | De Simone, Danilo | |
| dc.contributor.imecauthor | Gronheid, Roel | |
| dc.contributor.orcidimec | De Simone, Danilo::0000-0003-3927-5207 | |
| dc.date.accessioned | 2021-10-22T07:27:38Z | |
| dc.date.available | 2021-10-22T07:27:38Z | |
| dc.date.embargo | 9999-12-31 | |
| dc.date.issued | 2014 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/24725 | |
| dc.source.beginpage | 7A-8-2 | |
| dc.source.conference | 27th International Microprocesses and Nanotechnology Conference - MNC | |
| dc.source.conferencedate | 4/11/2014 | |
| dc.source.conferencelocation | Fukuoka Japan | |
| dc.title | Advanced lithography materials as key scaling enablers | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | Original bundle 
 | |
| Publication available in collections: |