Publication:

AVD and MOCVD TaCN-based films for gate metal applications on high-k gate dielectrics

Date

2007-10
Proceedings Paper
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Author(s)

Karim, Zia
;
Barbar, Ghassan
;
Boissiere, Olivier
;
Lehnen, Peer
;
Lohe, Christoph
;
Seidel, Tom
;
Adelmann, Christoph  
;
Conard, Thierry  
;
O'Sullivan, Barry  
;
Ragnarsson, Lars-Ake  
;
Schram, Tom  
;
Van Elshocht, Sven  
;
De Gendt, Stefan  

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Abstract

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