Publication:

In situ and real time studies of wet chemical silicon cleaning reactions

Date

1996
Proceedings Paper
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dc.contributor.authorSchmidt, Harald
dc.contributor.authorTeerlinck, Ivo
dc.contributor.authorStorm, Wolfgang
dc.contributor.authorBender, Hugo
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorHeyns, Marc
dc.date.accessioned2021-09-29T15:22:15Z
dc.date.available2021-09-29T15:22:15Z
dc.date.embargo9999-12-31
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1458
dc.source.beginpage480
dc.source.conferenceProceedings of the4th International Symposium on Cleaning technology in Semiconductor Device Manufacturing
dc.source.conferencedate9/10/1995
dc.source.conferencelocationChicago, IL USA
dc.source.endpage491
dc.title

In situ and real time studies of wet chemical silicon cleaning reactions

dc.typeProceedings paper
dspace.entity.typePublication
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