Publication:
Effect of deposition parameters and post-deposition treatments on the surface passivation obtained on crystalline silicon with ALD Al2O3
Date
| dc.contributor.author | Loozen, Xavier | |
| dc.contributor.author | Vermang, Bart | |
| dc.contributor.author | John, Joachim | |
| dc.contributor.author | Beaucarne, Guy | |
| dc.contributor.author | Poortmans, Jef | |
| dc.contributor.imecauthor | Vermang, Bart | |
| dc.contributor.imecauthor | John, Joachim | |
| dc.contributor.imecauthor | Poortmans, Jef | |
| dc.contributor.orcidimec | Vermang, Bart::0000-0003-2669-2087 | |
| dc.contributor.orcidimec | Poortmans, Jef::0000-0003-2077-2545 | |
| dc.date.accessioned | 2021-10-17T08:31:35Z | |
| dc.date.available | 2021-10-17T08:31:35Z | |
| dc.date.issued | 2008 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/14063 | |
| dc.identifier.url | no | |
| dc.source.beginpage | P-58 | |
| dc.source.conference | 8th International Conference on Atomic Layer Deposition - ALD 2008 | |
| dc.source.conferencedate | 29/06/2008 | |
| dc.source.conferencelocation | Brugge Belgium | |
| dc.title | Effect of deposition parameters and post-deposition treatments on the surface passivation obtained on crystalline silicon with ALD Al2O3 | |
| dc.type | Meeting abstract | |
| dspace.entity.type | Publication | |
| Files | ||
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