Publication:

Exploring the optimal combination of Ru/Ta bilayer mask stacks and illumination source shapes to mitigate mask 3D effects at high-NA extreme ultraviolet lithography

Date

2024
Journal article
https://doi.org/10.1364/OE.522907
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dc.contributor.authorThakare, Devesh
dc.contributor.authorDelabie, Annelies
dc.contributor.authorPhilipsen, Vicky
dc.contributor.imecauthorThakare, Devesh
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.orcidimecThakare, Devesh::0000-0003-3265-7042
dc.contributor.orcidimecDelabie, Annelies::0000-0001-9739-7419
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.date.accessioned2025-06-26T13:35:13Z
dc.date.available2024-11-16T16:49:18Z
dc.date.available2025-06-26T13:35:13Z
dc.date.embargo2024-10-08
dc.date.issued2024
dc.identifier.doi10.1364/OE.522907
dc.identifier.issn1094-4087
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/44789
dc.publisherOptica Publishing Group
dc.source.beginpage38203
dc.source.endpage38223
dc.source.issue22
dc.source.journalOPTICS EXPRESS
dc.source.numberofpages21
dc.source.volume32
dc.title

Exploring the optimal combination of Ru/Ta bilayer mask stacks and illumination source shapes to mitigate mask 3D effects at high-NA extreme ultraviolet lithography

dc.typeJournal article
dspace.entity.typePublication
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