Publication:
The lower boundary of the hydrogen concentration required for enhancing oxygen diffusion and thermal donor formation in Czochralski silicon
Date
| dc.contributor.author | Huang, Y.L. | |
| dc.contributor.author | Ma, Y. | |
| dc.contributor.author | Job, R. | |
| dc.contributor.author | Fahrner, W.R. | |
| dc.contributor.author | Simoen, Eddy | |
| dc.contributor.author | Claeys, Cor | |
| dc.contributor.imecauthor | Simoen, Eddy | |
| dc.contributor.orcidimec | Simoen, Eddy::0000-0002-5218-4046 | |
| dc.date.accessioned | 2021-10-16T02:12:28Z | |
| dc.date.available | 2021-10-16T02:12:28Z | |
| dc.date.issued | 2005 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/10620 | |
| dc.source.beginpage | 033511-1 | |
| dc.source.endpage | 033511-4 | |
| dc.source.issue | 3 | |
| dc.source.journal | Journal of Applied Physics | |
| dc.source.volume | 98 | |
| dc.title | The lower boundary of the hydrogen concentration required for enhancing oxygen diffusion and thermal donor formation in Czochralski silicon | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
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