Publication:
A manufacturable process to improve thermal stability of 0.25-µm cobalt silicided poly gate
Date
| dc.contributor.author | Wang, Qingfeng | |
| dc.contributor.author | Lauwers, A. | |
| dc.contributor.author | Deweerdt, Bruno | |
| dc.contributor.author | Verbeeck, Rita | |
| dc.contributor.author | Loosen, Fred | |
| dc.contributor.author | Maex, Karen | |
| dc.contributor.imecauthor | Deweerdt, Bruno | |
| dc.contributor.imecauthor | Verbeeck, Rita | |
| dc.contributor.imecauthor | Loosen, Fred | |
| dc.contributor.imecauthor | Maex, Karen | |
| dc.date.accessioned | 2021-09-29T13:25:08Z | |
| dc.date.available | 2021-09-29T13:25:08Z | |
| dc.date.issued | 1995 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/1005 | |
| dc.source.beginpage | 449 | |
| dc.source.endpage | 451 | |
| dc.source.issue | 4 | |
| dc.source.journal | IEEE Trans. Semiconductor Manufacturing | |
| dc.source.volume | 8 | |
| dc.title | A manufacturable process to improve thermal stability of 0.25-µm cobalt silicided poly gate | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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