Publication:

High-NA EUV Optical Proximity Correction Modeling Flow: from Data Preparation to Model Validation

Date

2025
Proceedings Paper
https://doi.org/10.1117/12.3072706
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dc.contributor.authorWei, Chih-, I
dc.contributor.authorChen, Chao-Heng
dc.contributor.authorThakare, Devesh
dc.contributor.authorLevinson, Zachary
dc.contributor.authorNge, Philip C. W.
dc.contributor.authorSchatz, Jirka
dc.contributor.authorWelling, Ulrich
dc.contributor.authorDawes, Andrew M. C.
dc.contributor.authorHopped, Wolfgang
dc.contributor.authorDemmerle, Wolfgang
dc.contributor.authorLiu, Ting-Chun
dc.contributor.authorPreuninger, Juergen
dc.contributor.authorYu, Zhiru
dc.contributor.authorKlosterman, Ulrich
dc.contributor.authorHwang, Soobin
dc.contributor.authorKareem, Pervaiz
dc.contributor.authorGillijns, Werner
dc.date.accessioned2026-03-31T07:52:53Z
dc.date.available2026-03-31T07:52:53Z
dc.date.createdwos2026-02-20
dc.date.issued2025
dc.identifier.doi10.1117/12.3072706
dc.identifier.isbn978-1-5106-9320-3
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/58977
dc.language.isoeng
dc.provenance.editstepusergreet.vanhoof@imec.be
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage136870Q
dc.source.conferencePhotomask Technology
dc.source.conferencedate2025-06-04
dc.source.conferencelocationRhodos
dc.source.journalPHOTOMASK TECHNOLOGY 2025
dc.source.numberofpages15
dc.title

High-NA EUV Optical Proximity Correction Modeling Flow: from Data Preparation to Model Validation

dc.typeProceedings paper
dspace.entity.typePublication
imec.internal.crawledAt2026-02-23
imec.internal.sourcecrawler
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