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Optimized Ni oxidation in 80 nm contact holes for integration of forming-free and low-power Ni/NiO/Ni memory cells
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1844 since deposited on 2021-10-17
Acq. date: 2025-12-15
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Views
1844 since deposited on 2021-10-17
Acq. date: 2025-12-15
Citations