Publication:
Plasma impact on the HfO2 high-k dielectric: Continuous-Wave plasma etch versus Quasi-Atomic Layer etch
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1775 since deposited on 2021-10-31
2last month
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Acq. date: 2026-10-12
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Statistics
Views
1775 since deposited on 2021-10-31
2last month
1last week
Acq. date: 2026-10-12
Citations