Publication:
Plasma impact on the HfO2 high-k dielectric: Continuous-Wave plasma etch versus Quasi-Atomic Layer etch
Date
Loading...
Journal
Abstract
Description
Statistics
Views
1773 since deposited on 2021-10-31
2last month
Acq. date: 2026-08-29
Citations
Statistics
Views
1773 since deposited on 2021-10-31
2last month
Acq. date: 2026-08-29
Citations