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Characterization of ultrathin high-k HfO2 layers grown on silicon: influence of the deposition parameters and interfacial layer
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1925 since deposited on 2021-10-15
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Acq. date: 2025-12-11
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Views
1925 since deposited on 2021-10-15
1last month
1last week
Acq. date: 2025-12-11
Citations