Publication:
Challenges for smoothing EUV photoresist line-width-roughness: plasma treatment from 40 to 22 nm half pitches
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1949 since deposited on 2021-10-21
Acq. date: 2025-10-29
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Views
1949 since deposited on 2021-10-21
Acq. date: 2025-10-29
Citations