Publication:
Challenges for smoothing EUV photoresist line-width-roughness: plasma treatment from 40 to 22 nm half pitches
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1952 since deposited on 2021-10-21
2last month
Acq. date: 2025-12-11
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Metrics
Views
1952 since deposited on 2021-10-21
2last month
Acq. date: 2025-12-11
Citations