Publication:
Challenges for smoothing EUV photoresist line-width-roughness: plasma treatment from 40 to 22 nm half pitches
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1957 since deposited on 2021-10-21
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Acq. date: 2026-08-05
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Statistics
Views
1957 since deposited on 2021-10-21
2last month
2last week
Acq. date: 2026-08-05
Citations