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MOCVD growth of DH-HEMT buffers with low-temperature AlN interlayer on 200 mm Si (111) substrate for breakdown voltage enhancement
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MOCVD growth of DH-HEMT buffers with low-temperature AlN interlayer on 200 mm Si (111) substrate for breakdown voltage enhancement
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Date
2016
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Zhao, Ming
;
Liang, Hu
;
Kandaswamy, Prem Kumar
;
Van Hove, Marleen
;
Venegas, Rafael
;
Vrancken, Evi
;
Favia, Paola
;
Vanderheyden, Annelies
;
Vanhaeren, Danielle
;
Saripalli, Yoga
;
Decoutere, Stefaan
;
Langer, Robert
Journal
Physica Status Solidi C
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1925
since deposited on 2021-10-23
Acq. date: 2025-12-09
Citations
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Views
1925
since deposited on 2021-10-23
Acq. date: 2025-12-09
Citations