Publication:
CMP of Ge and InP for microelectronic applications
Date
| dc.contributor.author | Ong, Patrick | |
| dc.contributor.author | Peddeti, Shivaji | |
| dc.contributor.author | Leunissen, Peter | |
| dc.contributor.author | Babu, S.V. | |
| dc.contributor.imecauthor | Ong, Patrick | |
| dc.contributor.orcidimec | Ong, Patrick::0000-0002-2072-292X | |
| dc.date.accessioned | 2021-10-19T16:54:11Z | |
| dc.date.available | 2021-10-19T16:54:11Z | |
| dc.date.issued | 2011 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/19512 | |
| dc.source.conference | 16th International Symposium on Chemical-Mechanical Planarization | |
| dc.source.conferencedate | 7/08/2011 | |
| dc.source.conferencelocation | Lake Placid, NY USA | |
| dc.title | CMP of Ge and InP for microelectronic applications | |
| dc.type | Oral presentation | |
| dspace.entity.type | Publication | |
| Files | ||
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