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Study of the reducing of defect density in STI etch process
Publication:
Study of the reducing of defect density in STI etch process
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Date
2011
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Danilkin, E.
;
Kozulin, R.
;
Polyakov, A.
;
Trutaeva, M.
;
Shamiryan, Denis
;
Islyaykin, A.
;
Gutshin, O.P.
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1850
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Views
1850
since deposited on 2021-10-19
3
last month
Acq. date: 2025-12-12
Citations