Publication:

Evaluation of ozonated water spray for resist cleaning applications

Date

2000
Proceedings Paper
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dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorLux, Marcel
dc.contributor.authorClaes, Martine
dc.contributor.authorVan Hoeymissen, Jan
dc.contributor.authorConard, Thierry
dc.contributor.authorWorth, W.
dc.contributor.authorLagrange, Sébastien
dc.contributor.authorBergman, E.
dc.contributor.authorJassal, A. S.
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorLux, Marcel
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.date.accessioned2021-10-14T12:48:05Z
dc.date.available2021-10-14T12:48:05Z
dc.date.embargo9999-12-31
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4254
dc.source.beginpage391
dc.source.conferenceCleaning Technology in Semiconductor Device Manufacturing. Proceedings of the 6th International Symposium
dc.source.conferencedate17/10/1999
dc.source.conferencelocationHonolulu, HI USA
dc.source.endpage398
dc.title

Evaluation of ozonated water spray for resist cleaning applications

dc.typeProceedings paper
dspace.entity.typePublication
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