Publication:

Impact of alternative mask stacks on the imaging performance at NA 1.20 and above

Date

2007
Proceedings Paper
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dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorMesuda, Kei
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorErdmann, Andreas
dc.contributor.authorCitarella, Giuseppe
dc.contributor.authorEvanschitzky, Peter
dc.contributor.authorBirkner, Robert
dc.contributor.authorRichter, Rigo
dc.contributor.authorScherübl, Thomas
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.date.accessioned2021-10-16T18:37:34Z
dc.date.available2021-10-16T18:37:34Z
dc.date.embargo9999-12-31
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12703
dc.source.beginpage67301N
dc.source.conferenceSPIE Photomask Technology (BACUS)
dc.source.conferencedate18/09/2007
dc.source.conferencelocationMonterey, CA USA
dc.title

Impact of alternative mask stacks on the imaging performance at NA 1.20 and above

dc.typeProceedings paper
dspace.entity.typePublication
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