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Thermally-stable high effective work function TaCN and Ta2N films for pMOS metal gate applications
Publication:
Thermally-stable high effective work function TaCN and Ta2N films for pMOS metal gate applications
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Date
2008
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Adelmann, Christoph
;
Lehnen, Peer
;
Ragnarsson, Lars-Ake
;
Conard, Thierry
;
Franquet, Alexis
;
Chang, Vincent
;
Rohr, Erika
;
Meersschaut, Johan
;
Boissiere, Olivier
;
Lohe, Christoph
;
Schram, Tom
;
Van Elshocht, Sven
;
De Gendt, Stefan
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1881
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Acq. date: 2025-12-11
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Views
1881
since deposited on 2021-10-17
2
last month
Acq. date: 2025-12-11
Citations