Calculation of dielectric constant of porous SiCOH low-k films

dc.contributor.author	Palov, A.
dc.contributor.author	Rakhimova, T
dc.contributor.author	Krishtab, Mikhail
dc.contributor.author	Baklanov, Mikhaïl
dc.contributor.imecauthor	Krishtab, Mikhail
dc.date.accessioned	2021-10-22T21:36:01Z
dc.date.available	2021-10-22T21:36:01Z
dc.date.embargo	9999-12-31
dc.date.issued	2015
dc.identifier.issn	1071-1023
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/25725
dc.identifier.url	http://scitation.aip.org/content/avs/journal/jvstb/33/2/10.1116/1.4906816
dc.source.beginpage	20603
dc.source.issue	2
dc.source.journal	Journal of Vacuum Science and Technology B
dc.source.volume	33
dc.title	Calculation of dielectric constant of porous SiCOH low-k films
dc.type	Journal article
dspace.entity.type	Publication
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