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Novel membrane solutions for the EUV pellicle : better or not ?

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dc.contributor.authorPollentier, Ivan
dc.contributor.authorLee, Jae Uk
dc.contributor.authorTimmermans, Marina
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorZahedmanesh, Houman
dc.contributor.authorHuyghebaert, Cedric
dc.contributor.authorGallagher, Emily
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorLee, Jae Uk
dc.contributor.imecauthorTimmermans, Marina
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorZahedmanesh, Houman
dc.contributor.imecauthorHuyghebaert, Cedric
dc.contributor.imecauthorGallagher, Emily
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecLee, Jae Uk::0000-0002-9434-5055
dc.contributor.orcidimecTimmermans, Marina::0000-0001-9805-8259
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecHuyghebaert, Cedric::0000-0001-6043-7130
dc.contributor.orcidimecGallagher, Emily::0000-0002-2927-8298
dc.date.accessioned2021-10-24T11:15:39Z
dc.date.available2021-10-24T11:15:39Z
dc.date.embargo9999-12-31
dc.date.issued2017
dc.identifier.doi10.1117/12.2257891
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29202
dc.source.beginpage101430L
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography VIII
dc.source.conferencedate26/02/2017
dc.source.conferencelocationSan Jose, CA USA
dc.title

Novel membrane solutions for the EUV pellicle : better or not ?

dc.typeProceedings paper
dspace.entity.typePublication
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