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BEOL N2: M2 through SAxP process from MP21 to MP26: 193i SAQP vs EUV SADP

Date

2023-04-28
Proceedings Paper
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dc.contributor.authorHermans, Yannick
dc.contributor.authorWu, Chen
dc.contributor.authorBuccheri, Nunzio
dc.contributor.authorSchleicher, Filip
dc.contributor.authorVersluijs, Janko
dc.contributor.authorMontero Alvarez, Daniel
dc.contributor.authorDey, Bappaditya
dc.contributor.authorWong, Patrick
dc.contributor.authorRincon Delgadillo, Paulina
dc.contributor.authorPark, Seongho
dc.contributor.authorTokei, Zsolt
dc.contributor.authorLeray, Philippe
dc.contributor.authorHalder, Sandip
dc.contributor.imecauthorHermans, Yannick
dc.contributor.imecauthorWu, Chen
dc.contributor.imecauthorBuccheri, Nunzio
dc.contributor.imecauthorSchleicher, Filip
dc.contributor.imecauthorVersluijs, Janko
dc.contributor.imecauthorMontero Alvarez, Daniel
dc.contributor.imecauthorDey, Bappaditya
dc.contributor.imecauthorWong, Patrick
dc.contributor.imecauthorRincon Delgadillo, Paulina
dc.contributor.imecauthorPark, Seongho
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorHalder, Sandip
dc.contributor.orcidimecHermans, Yannick::0000-0002-6973-0795
dc.contributor.orcidimecDey, Bappaditya::0000-0002-0886-137X
dc.contributor.orcidimecMontero Alvarez, Daniel::0000-0001-9966-0399
dc.contributor.orcidimecSchleicher, Filip::0000-0003-3630-7285
dc.contributor.orcidimecWu, Chen::0000-0002-4636-8842
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.contributor.orcidimecWong, Patrick::0000-0003-3605-9680
dc.contributor.orcidimecLeray, Philippe::0000-0002-1086-270X
dc.contributor.orcidimecTokei, Zsolt::0000-0003-3545-3424
dc.date.accessioned2024-05-16T11:47:29Z
dc.date.available2023-06-26T09:47:15Z
dc.date.available2024-05-16T11:47:29Z
dc.date.embargo2023-03-03
dc.date.issued2023-04-28
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/42095
dc.source.conferenceConference on Optical and EUV Nanolithography XXXVI Part of SPIE Advanced Lithography and Patterning Conference
dc.source.conferencedate23/02/2023
dc.source.conferencelocationSan Jose
dc.source.journalProceedings of SPIE
dc.source.numberofpages7
dc.title

BEOL N2: M2 through SAxP process from MP21 to MP26: 193i SAQP vs EUV SADP

dc.typeProceedings paper
dspace.entity.typePublication
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