Towards Low Contact Resistance Metal Transition-Metal Dichalcogenide Contacts - A Quantum Transport Study

dc.contributor.author	Baikadi, Pranay
dc.contributor.author	Kim, Raseong
dc.contributor.author	Reyntjens, Peter
dc.contributor.author	Penumatcha, Ashish Verma
dc.contributor.author	Van de Put, Maarten
dc.contributor.author	Vandenberghe, William G.
dc.contributor.imecauthor	Reyntjens, Peter
dc.contributor.imecauthor	Van de Put, Maarten
dc.contributor.orcidimec	Van de Put, Maarten::0000-0001-9179-6443
dc.date.accessioned	2025-06-05T14:27:27Z
dc.date.available	2025-02-23T23:40:20Z
dc.date.available	2025-06-05T14:27:27Z
dc.date.issued	2024
dc.description.wosFundingText	This material is based upon work supported by Intel Corporation. We acknowledge the Texas Advanced Computing Center at The University of Texas at Austin for providing high performance computing resources.
dc.identifier.doi	10.1109/SISPAD62626.2024.10732911
dc.identifier.eisbn	979-8-3315-1635-2
dc.identifier.isbn	979-8-3315-1636-9
dc.identifier.issn	N/A
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/45240
dc.publisher	IEEE
dc.source.conference	International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)
dc.source.conferencedate	SEP 24-27, 2024
dc.source.conferencelocation	San Jose
dc.source.journal	N/A
dc.source.numberofpages	4
dc.title	Towards Low Contact Resistance Metal Transition-Metal Dichalcogenide Contacts - A Quantum Transport Study
dc.type	Proceedings paper
dspace.entity.type	Publication
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