Publication:

Integration feasibility of porous SiLK semiconductor dielectric

Date

2001
Proceedings Paper
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dc.contributor.authorWaeterloos, Joost
dc.contributor.authorStruyf, Herbert
dc.contributor.authorVan Aelst, Joke
dc.contributor.authorCastillo, D. W.
dc.contributor.authorLucero, S.
dc.contributor.authorCaluwaerts, Rudy
dc.contributor.authorAlaerts, Carine
dc.contributor.authorMannaert, Geert
dc.contributor.authorBoullart, Werner
dc.contributor.authorSleeckx, Erik
dc.contributor.authorSchaekers, Marc
dc.contributor.authorTokei, Zsolt
dc.contributor.authorVervoort, Iwan
dc.contributor.authorSteenbergen, Johnny
dc.contributor.authorSijmus, Bram
dc.contributor.authorVos, I.
dc.contributor.authorMeuris, Marc
dc.contributor.authorIacopi, Francesca
dc.contributor.authorDonaton, R
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorVan Aelst, Joke
dc.contributor.imecauthorCaluwaerts, Rudy
dc.contributor.imecauthorMannaert, Geert
dc.contributor.imecauthorBoullart, Werner
dc.contributor.imecauthorSleeckx, Erik
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorSteenbergen, Johnny
dc.contributor.imecauthorMeuris, Marc
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.contributor.orcidimecSleeckx, Erik::0000-0003-2560-6132
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.accessioned2021-10-14T18:22:28Z
dc.date.available2021-10-14T18:22:28Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5827
dc.source.beginpage253
dc.source.conferenceProceedings of the IEEE 2001 International Interconnect Technology Conference
dc.source.conferencedate4/06/2001
dc.source.conferencelocationBurlingame, CA USA
dc.source.endpage254
dc.title

Integration feasibility of porous SiLK semiconductor dielectric

dc.typeProceedings paper
dspace.entity.typePublication
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