Publication:

Influence of CH4/H2 reactive ion etching on electrical and optical properties of AlGaAs/GaAs and pseudomorphic AlGaAs/InGaAs/GaAs heterostructures

Date

1995
Journal article
Simple item page Full metadata Statistics
 
dc.contributor.authorvan Es, C. M.
dc.contributor.authorEijkemans, T. J.
dc.contributor.authorWolter, J. H.
dc.contributor.authorPereira, Ricardo
dc.contributor.authorVan Hove, Marleen
dc.contributor.authorVan Rossum, Marc
dc.date.accessioned2021-09-29T13:19:12Z
dc.date.available2021-09-29T13:19:12Z
dc.date.embargo9999-12-31
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/938
dc.source.beginpage41
dc.source.endpage45
dc.source.journalMaterials Science and Technology
dc.source.volume11
dc.title

Influence of CH4/H2 reactive ion etching on electrical and optical properties of AlGaAs/GaAs and pseudomorphic AlGaAs/InGaAs/GaAs heterostructures

dc.typeJournal article
dspace.entity.typePublication
Files

Original bundle

Name:
913.pdf
Size:
394.69 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Articles