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Conference contributions
157-nm photoresist process optimization for a full-field scanner
Publication:
157-nm photoresist process optimization for a full-field scanner
Date
2004-03
Proceedings Paper
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9527.pdf
1.77 MB
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Light, Scott
;
Stepanenko, Nickolay
;
Gronheid, Roel
;
Van Roey, Frieda
;
Van Den Heuvel, Dieter
;
Goethals, Mieke
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2077
since deposited on 2021-10-15
Acq. date: 2025-10-23
Citations
Metrics
Views
2077
since deposited on 2021-10-15
Acq. date: 2025-10-23
Citations