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Investigation of low temperature epitaxial SiGe:P in view of source/drain application for 5nm technology node and below.
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1943 since deposited on 2021-10-28
5last month
Acq. date: 2026-01-05
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Metrics
Views
1943 since deposited on 2021-10-28
5last month
Acq. date: 2026-01-05
Citations