Publication:
Applying a thin imaging resist system to substrates with topography
Date
| dc.contributor.author | Neisser, M. | |
| dc.contributor.author | Grosev, G. | |
| dc.contributor.author | Maenhoudt, Mireille | |
| dc.contributor.author | Lepage, Muriel | |
| dc.contributor.author | Struyf, Herbert | |
| dc.contributor.imecauthor | Struyf, Herbert | |
| dc.date.accessioned | 2021-10-14T13:26:48Z | |
| dc.date.available | 2021-10-14T13:26:48Z | |
| dc.date.issued | 2000 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/4610 | |
| dc.source.beginpage | 127 | |
| dc.source.issue | 8 | |
| dc.source.journal | Solid State Technology | |
| dc.source.volume | 43 | |
| dc.title | Applying a thin imaging resist system to substrates with topography | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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