Publication:

Effect of N2 anneal on thin HfO2 layers studied by C-AFM

Date

2004
Journal article
Simple item page Full metadata Statistics
 
dc.contributor.authorPetry, Jasmine
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorBlasco, X.
dc.contributor.imecauthorVandervorst, Wilfried
dc.date.accessioned2021-10-15T15:25:19Z
dc.date.available2021-10-15T15:25:19Z
dc.date.embargo9999-12-31
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9420
dc.source.beginpage174
dc.source.endpage179
dc.source.issue1_4
dc.source.journalMicroelectronic Engineering
dc.source.volume72
dc.title

Effect of N2 anneal on thin HfO2 layers studied by C-AFM

dc.typeJournal article
dspace.entity.typePublication
Files

Original bundle

Name:
7788.pdf
Size:
332.06 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Articles