Publication:

Capturing the Effects of Spatial Process Variations in Silicon Photonic Circuits

Date

2023
Journal article
https://doi.org/10.1021/acsphotonics.2c01194
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dc.contributor.authorXing, Yufei
dc.contributor.authorDong, Jiaxing
dc.contributor.authorKhan, Muhammad Umar
dc.contributor.authorBogaerts, Wim
dc.contributor.imecauthorXing, Yufei
dc.contributor.imecauthorDong, Jiaxing
dc.contributor.imecauthorKhan, Muhammad Umar
dc.contributor.imecauthorBogaerts, Wim
dc.contributor.orcidimecKhan, Muhammad Umar::0000-0001-5760-7485
dc.contributor.orcidimecBogaerts, Wim::0000-0003-1112-8950
dc.date.accessioned2023-05-24T06:56:03Z
dc.date.available2022-12-10T03:09:31Z
dc.date.available2023-05-24T06:56:03Z
dc.date.embargo2022-11-22
dc.date.issued2023
dc.description.wosFundingTextFunding This work was supported by the Flemish Research Foundation (FWO-Vlaanderen) through Grant No. G013815N, and by the Flemish Agency for Innovation (VLAIO) and Luceda Photonics through the MEPIC project.
dc.identifier.doi10.1021/acsphotonics.2c01194
dc.identifier.issn2330-4022
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40855
dc.publisherAMER CHEMICAL SOC
dc.source.beginpage928
dc.source.endpage944
dc.source.issue4
dc.source.journalACS PHOTONICS
dc.source.numberofpages17
dc.source.volume10
dc.subject.keywordsINVERSE DESIGN
dc.subject.keywordsOPTIMIZATION
dc.subject.keywordsFABRICATION
dc.subject.keywordsTECHNOLOGY
dc.title

Capturing the Effects of Spatial Process Variations in Silicon Photonic Circuits

dc.typeJournal article
dspace.entity.typePublication
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